[G5-P203] Poster 203

[G5-P203-12] Controlled Growth of µm-sized Grains in VO₂ Thin Films via Biased Sputtering

*Nurul Hanis Azhan¹, Abdul Manaf Hashim¹, Kunio Okimura² (1. Malaysia-Japan International Institute of Technology (MJIIT), Universiti Teknologi Malaysia (UTM), Jalan Sultan Yahya Petra, 54100 Kuala Lumpur (Malaysia), 2. Graduate School of Engineering, Tokai University, Hiratsuka, 259-1292 Kanagawa (Japan))

Keywords:

Vanadium Dioxide,Insulator-Metal Transition,Biased Sputtering,Recrystallization