Materials Research Meeting 2025 (MRM2025)
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Poster SessionG. Advanced Materials and Emerging Technologies for Device Development : [G-5]Synthesis and applications of phase transition oxide films

[G5-P203]Poster 203

Wed. Dec 10, 2025 6:00 PM - 8:00 PM JST
Wed. Dec 10, 2025 9:00 AM - 11:00 AM UTC
Poster(G1+G2)

[G5-P203-01]Modulation of insulator-metal transition of VO2 films grown on TiO2 (001) with crystallization of capping GST layer

*Keisuke Kudo1, Yiqi Liu1, Kunio Okimura1, Joe Sakai2, Masashi Kuwahara3, Satoshi Katano4, Yuji Muraoka5 (1. Tokai Univ. (Japan), 2. Toshima Manufac. Co. Ltd. (Japan), 3. Nation Inst. of Advanced Indus. Sci. and Tech. (Japan), 4. Toyo Univ. (Japan), 5. Okayama Univ. RIIS (Japan))

[G5-P203-02]Improvement of optical performance of VO2-based smart windows with TiO2 anti-reflection coatings

*Taiyo Hirono1, Hideki Nakae1, Kunio Okimura1, Md sruze Mian1, Tomohiko Nakajima2, Iwao Yamaguchi2 (1. Tokai Univ. (Japan), 2. National Inst. of Advanced Indus. Sci. and Tech. (Japan))

[G5-P203-03]Self-sustained electrical oscillations over 1 MHz in layered structures of VO2 films grown on conductive films

*Rikuto Ura1, Md. Suruz Mian1, Kunio Okimura1, Toshihiro Nakanishi2 (1. Tokai Univ (Japan), 2. Kyoto Univ (Japan))

[G5-P203-04]A study on temperature evolution of voltage-triggered switching of infrared light transmittance in VO2/AZO layered films

*Tian Lan1, Peng Yu1, Rai Hiranabe1, Kunio Okimura1 (1. Tokai Univ. (Japan))

[G5-P203-05]Effect of TiO2 buffer layers on the growth of crystalline VO2 films for optical switching applications

*Ryohei Wakayama1, Md Suruz Mian1, Kunio Okimura1 (1. Tokai Univ. (Japan))

[G5-P203-06]Molecular beam epitaxial growth of β-phase MoO3 single-crystalline thin films and the effects of electrochemical proton intercalation

*Hiroto Tsuruyama1, Yuto Kanbayashi1, Sena Yamamoto1, Yuichi Hirofuji1, Nobuya Hiroshiba1, Kazuto Koike1 (1. Osaka Inst. of Tech., NMRC (Japan))

[G5-P203-07]Characterization of Ta doped VO2 thin films deposited on flexible ultrathin glass via MOD

*Chihiro Kuwayama1, Yasuto Takami1, Atsuro Shimonaka1, Ryosuke Mitoguchi1, Nobuya Hiroshiba1, Kazuto Koike1, Masami Kawahara2, Hideo Wada1 (1. Osaka Inst. of Tech., NMRC (Japan), 2. Kojundo Chemical Laboratory Co., Ltd. (Japan))

[G5-P203-08]Enhancement of optical absorption of vanadium dioxide by surface plasmon from metallic structure

*Taishi Ueda1, Atsushi Sanada1, Yosuke Nakata1 (1. the Univ. of Osaka (Japan))

[G5-P203-09]Voltage-triggered infrared light switching of VO2 thin films grown on transparent conductive Al-doped ZnO

*Peng Yu1, Rai Hiranabe1, Tian Lan1, Kunio Okimura1, Yuki Ono2, Yosuke Nakata2 (1. Tokai Univ (Japan), 2. Univ. of Osaka (Japan))

[G5-P203-10]A multilayer matasurface design of the switchable circular polarizer based on Babinet-invertible structure

*Yuki Ono1, Andriy Serebryannikov2, Atsushi Sanada1, Yosuke Nakata1 (1. The Univ. of Osaka (Japan), 2. Adam Mickiewicz Univ. (Poland))

[G5-P203-11]Fast modulation of transmittance for infrared-light in flexible VO2 films by voltage triggered switching

*Rai Hiranabe1, Peng Yu1, Tian Lan1, Yilin Wang1, Kunio Okimura1, Yousuke Nakata2 (1. Tokai Univ. (Japan), 2. Univ. of Osaka (Japan))

[G5-P203-12]Controlled Growth of µm-sized Grains in VO2 Thin Films via Biased Sputtering

*Nurul Hanis Azhan1, Abdul Manaf Hashim1, Kunio Okimura2 (1. Malaysia-Japan International Institute of Technology (MJIIT), Universiti Teknologi Malaysia (UTM), Jalan Sultan Yahya Petra, 54100 Kuala Lumpur (Malaysia), 2. Graduate School of Engineering, Tokai University, Hiratsuka, 259-1292 Kanagawa (Japan))

[G5-P203-13]Chemical synthesis of VO2 films composed of microrods by utilizing vanadyl compound materials

*Shimpei Shimono1, Kunio Okimura1, Md. Suruz Mian1, Nurul Hanis Azhan2 (1. Tokai Univ. (Japan), 2. Malaysia-Japan Int'l. Inst. of Tech., Univ. Tech. Malaysia (Malaysia))

[G5-P203-14]Ge2Sb2Te5-crystallization-induced stress effect on insulator-metal transition temperature in VO2 films grown on Al2O3 (001)

*YIQI LIU1, Kunio Okimura1, Keisuke Kudo1, Joe Sakai2, Masashi Kuwahara3, Satoshi Katano4, Yuji Muraoka5 (1. Tokai Univ. (Japan), 2. Toshima Manufac. Co., Ltd. (Japan), 3. National Institute of Advanced Indus. (Japan), 4. Toyo Univ. (Japan), 5. Okayama Univ. RIIS (Japan))

[G5-P203-15]Effect of TiO2/ZnO buffer layer on the growth of VO2 films for infrared light switching

*Hideki Nakae1, Taiyo Hirono1, Kunio Okimura1, Tomohiko Nakajima2 (1. Tokai Univ. (Japan), 2. National Institute of Advanced Indus. and Tech. (Japan))
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