Presentation Information

[H1-O302-01]Comparative study of HfO2-based and Wurtzite-based ferroelectrics from epitaxial film study

*Hiroshi Funakubo1, Kazuki Okamoto1, Takanori Mimura2, Takao Shimizu3,1 (1. Institute of Science Tokyo (Japan), 2. Gakushuin Univ. (Japan), 3. National Institute for Materials Science (NIMS), (Japan))

Keywords:

HfO2,Wrutzite,ferroelectric thin film