[H4-O501] Oral 501

9:40 AM - 10:20 AM JST(12:40 AM - 1:20 AM UTC)

[H4-O501-02] Effects of target poisoning ratios on the fabrication of high entropy alloy carbide thin films by HiPIMS

*Jyh-Wei Lee¹, Bih-Show Lou² (1. Ming Chi Univ. of Tech. (Taiwan), 2. Chang Gung Univ. (Taiwan))

Keywords:

High entropy alloy carbide thin film,CrMoNbWC,AlCrNbSiTiC,target poisoning ratio,plasma emission monitoring