Materials Research Meeting 2025 (MRM2025)
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Session Details

Oral SessionH．High-Performance Functional Materials: Preparation, Processing, and Characterization : [H-4]Advanced Plasma Processing in the New Era

[H4-O501]Oral 501

Sat. Dec 13, 2025 9:00 AM - 12:00 PM JST
Sat. Dec 13, 2025 12:00 AM - 3:00 AM UTC
Session 4(G314+G315)
Chair:Osamu Sakai(The Univ.of Shiga Prefecture)
9:00 AM - 9:40 AM JST(12:00 AM - 12:40 AM UTC)

[H4-O501-01]Development of Integrated Sensing Technologies for Real-Time Monitoring and Endpoint Detection in Plasma Chamber Processes

*Kyongnam Kim1, Suyoung Jang1, Dohyeun Kim1, Junyeob Lee1 (1. Daejeon University (Korea))
9:40 AM - 10:20 AM JST(12:40 AM - 1:20 AM UTC)

[H4-O501-02]Effects of target poisoning ratios on the fabrication of high entropy alloy carbide thin films by HiPIMS

*Jyh-Wei Lee1, Bih-Show Lou2 (1. Ming Chi Univ. of Tech. (Taiwan), 2. Chang Gung Univ. (Taiwan))
10:20 AM - 10:40 AM JST(1:20 AM - 1:40 AM UTC)

[H4-O501-03]Molecular density dependence of electric-field-induced coherent anti-Stokes Raman scattering intensity under water vapor environments

*Lisa Kobodo1, Takeru Koike1, David Pai2, Hitoshi Muneoka1, Kazuo Terashima1, Tsuyohito Ito1 (1. The Univ.of Tokyo (Japan), 2. CNRS LPP École polytechnique (France))
10:40 AM - 11:00 AM JST(1:40 AM - 2:00 AM UTC)

[H4-O501-04]Gas composition analysis in hydrocarbon mixture plasmas by optical emission spectroscopy using machine learning with engineered spectral features

*Riku Tamura1, Shuhei Takamatsu1, Hitoshi Muneoka1, Kazuo Terashima1, Tsuyohito Ito1 (1. The University of Tokyo (Japan))
11:00 AM - 11:20 AM JST(2:00 AM - 2:20 AM UTC)

[H4-O501-05]Grey Box Approaches and Beyond for Plasma Processing

*Masaharu Shiratani Shiratani1, Sukma Wahyu Fitriani1, Kunihiro Kamataki1 (1. Kyushu Univ. (Japan))
11:20 AM - 12:00 PM JST(2:20 AM - 3:00 AM UTC)

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