[H4-P302] Poster 302

[H4-P302-05] Preparation of gradient Mo element thin films by sputtering with mixed powder targets

*Hiroharu Kawasaki¹, Takahiko Satake^1,2, Akihiro Ikeda² (1. National Institute of Technology, Sasebo College (Japan), 2. Sojo University (Japan))

Keywords:

Powder target,Plasma Process,Sputtering Deposition