Materials Research Meeting 2025 (MRM2025)
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Poster SessionH．High-Performance Functional Materials: Preparation, Processing, and Characterization : [H-4]Advanced Plasma Processing in the New Era

[H4-P302]Poster 302

Thu. Dec 11, 2025 3:30 PM - 5:30 PM JST
Thu. Dec 11, 2025 6:30 AM - 8:30 AM UTC
Poster(G1+G2)

[H4-P302-01]Machine Learning-Driven Optimization of PECVD-Deposited DLC Films via Raman Spectra-Based PLS Regression

*Yoshihisa Osano1,2, Tatsuyuki Nakatani1,3 (1. Okayama Univ. of Sci. (Japan), 2. Mitsubishi Pencil Co., Ltd. (Japan), 3. Keio Univ. (Japan))

[H4-P302-02]Electrocatalytic properties evaluation of FeNiMoWCu high entropy alloy thin films fabricated by magnetron sputtering

*Bih-Show Lou1, Kuan-Chen Lin2, Jyh-Wei Lee2 (1. Chang Gung University (Taiwan), 2. Ming Chi University of Technology (Taiwan))

[H4-P302-03]Plasma Universal Synthesis of Single-Atom Catalyst for Enhanced Multicatalytic and Nanoenzymatic Activities

*Tammy Laysandra1, Darwin Kurniawan1, Wei-Hung Chiang1 (1. National Taiwan University of Science and Technology (Taiwan))

[H4-P302-04]Development of nanostructured Ge/C composite anodes fabricated via Ar high-pressure sputtering for Li-ion-battery anode

*Giichiro Uchida1 (1. Meijo Univ. (Japan))

[H4-P302-05]Preparation of gradient Mo element thin films by sputtering with mixed powder targets

*Hiroharu Kawasaki1, Takahiko Satake1,2, Akihiro Ikeda2 (1. National Institute of Technology, Sasebo College (Japan), 2. Sojo University (Japan))

[H4-P302-06]Evaluation of Charge of a Microparticle Levitated around Plasma/Sheath Boundary Using Optical Tweezers

*Takuro Sugita1, Kousei Iguchi1, Kunihiro Kamataki1, Daisuke Yamashita1, Takamasa Okumura1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1 (1. Kyushu Univ (Japan))

[H4-P302-07]Effect of Discharge Frequency on Characteristics of a-C:H Films Deposited by Cumene Plasma CVD

*Shunpei Ohara1, Shinjiro Ono1, Manato Eri1, Ryosuke Kinnami1, Soichiro Yoshida1, Takamasa Okumura1, Naho Itagaki1, Kunihiro Kamataki1, Kazunori Koga1, Masaharu Shiratani1 (1. Graduate School and Faculty of Info. Sci. and Electrical Eng., Kyushu Univ. (Japan))

[H4-P302-08]Effect of Noble Gas and Precursor Gas Mixing Ratio on Film Properties in Ar/He/C2H2-Based Plasma Enhanced CVD

*Kazuki Nagamine1, Daichi Wakita1, Shunichi Takahashi1, Kunihiro Kamataki1, Masaharu Shiratani1 (1. Kyushu Univ (Japan))

[H4-P302-09]Effects of amplitude-modulated waveform excitation on spatio-temporal distribution of emission intensity of Ar 2p1 in Ar capacitively coupled plasmas

*Daichi Wakita1, Kazuki Nagamine1, Shunichi Takahashi1, Kunihiro Kamataki1, Takamasa Okumura1, Naho Itagaki1, Kazunori Koga1, Hasaharu Shiratani1 (1. Kyushu University (Japan))

[H4-P302-10]Investigation of SiO2 Film Quality Enhancement on Trench Sidewalls by Voltage-Amplitude Modulated Plasma Deposition: COMSOL Multiphysics

*Yousei Kurosaki1, Yuma Yamamoto1, Yushi Sato1, Sukma Wahyu Fitriani1, Kunihiro Kamataki1, Daisuke Yamashita1, Takamasa Okumura1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1 (1. Kyushu Univ. (Japan))

[H4-P302-11]Influence of Nanoscale Carbon Nanoparticles on Macroscopic Stress and Adhesion in Hydrogenated Amorphous Carbon Films

*Shinjiro Ono1, Manato Eri1, Takamasa Okumura1, Kunihiro Kamataki1, Kazunori Koga1, Masaharu Shiratani1 (1. Kyushu University (Japan))

[H4-P302-12]Effects of Substrate Bias and Working Pressure on Deposition Characteristics of a-C:H Films Using Cumene Plasma CVD

*Manato Eri1, Shinjiro Ono1, Shumpei Ohara1, Takamasa Okumura1, Kunihiro Kamataki1, Haruki Kiyama1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1 (1. Kyushu Univ. (Japan))
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