[H4-P302] Poster 302

[H4-P302-07] Effect of Discharge Frequency on Characteristics of a-C:H Films Deposited by Cumene Plasma CVD

*Shunpei Ohara¹, Shinjiro Ono¹, Manato Eri¹, Ryosuke Kinnami¹, Soichiro Yoshida¹, Takamasa Okumura¹, Naho Itagaki¹, Kunihiro Kamataki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1. Graduate School and Faculty of Info. Sci. and Electrical Eng., Kyushu Univ. (Japan))

Keywords:

Hydrogenated amorphous carbon,plasma CVD,cumene,hard mask,etching