Presentation Information

[H4-P302-08]Effect of Noble Gas and Precursor Gas Mixing Ratio on Film Properties in Ar/He/C2H2-Based Plasma Enhanced CVD

*Kazuki Nagamine1, Daichi Wakita1, Shunichi Takahashi1, Kunihiro Kamataki1, Masaharu Shiratani1 (1. Kyushu Univ (Japan))

Keywords:

Plasma Process,Plasma Enhanced CVD,amorphous carbon