Presentation Information
[H4-P302-10]Investigation of SiO2 Film Quality Enhancement on Trench Sidewalls by Voltage-Amplitude Modulated Plasma Deposition: COMSOL Multiphysics
*Yousei Kurosaki1, Yuma Yamamoto1, Yushi Sato1, Sukma Wahyu Fitriani1, Kunihiro Kamataki1, Daisuke Yamashita1, Takamasa Okumura1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1 (1. Kyushu Univ. (Japan))
Keywords:
COMSOL Multiphysics,PECVD,SiO2,Trench Sidewall