Presentation Information
[H4-P302-12]Effects of Substrate Bias and Working Pressure on Deposition Characteristics of a-C:H Films Using Cumene Plasma CVD
*Manato Eri1, Shinjiro Ono1, Shumpei Ohara1, Takamasa Okumura1, Kunihiro Kamataki1, Haruki Kiyama1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1 (1. Kyushu Univ. (Japan))
Keywords:
hydrogenated amorphous carbon,plasma enhanced chemical vapor deposition,cumene