Presentation Information
[20111-20-09]Polarity control of Sc-AlN films deposited by Industrial Scale Reactive Magnetron Sputtering
*Volker Roebisch1, Demian Henzen1, Antonio Verdicchia1, Martin Kratzer1, Oguz Yildirim1, Dino Faralli1, Bernd Heinz1 (1. EVATEC AG, Switzerland)
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