Presentation Information
[Tu3-P32-17]Formation of Etching Barrier by Using SiOxNy as Tunnel Layer in TOPCon Structure
*Mingun Kim1, Hoyoung Song1, Donghwan Kim1, Hae-Seok Lee3, Yoonmook Kang3, Youngho Choe2 (1. Department of Materials Science and Engineering, Korea University, Republic of Korea (Korea), 2. Institute of Energy Technology, Korea University, Republic of Korea (Korea), 3. Graduate School of Energy and Environment (KU-KIST Green School), Korea University, Republic of Korea (Korea))