Presentation Information
[Tu4-P52-35]Investigation of defect reduction and hydrogen diffusion in Si/SiO2 multilayer films by hydrogen radical treatment
*Shigeru Yamada1, Naoki Matsuo1, Tomohiro Deto1, Tomoki Fujisawa1, Yuto Ebata1, Yuki Nishi1, Takashi Itoh1 (1. Gifu University (Japan))