[We2d-O31] Sub area 3-1: Defect engineering

12:15 PM - 12:30 PM JST(3:15 AM - 3:30 AM UTC)

[We2d-O31-05] Super high-rate sputtering of high-quality hydrogenated amorphous silicon passivation layer

*Shasha Li¹, Shinsuke Miyajima¹ (1. Tokyo Institute of Technology (Japan))