Presentation Information
[P-27]Twisting in High Aspect Ratio Etching with Charging Effects as a Stochastic Mechanism
*Taishi Ikeda1, Hisashi Kotakemori1, Satoshi Nakamura1, Kenta Yashima1, Takumi Ohmura1, Yasuyuki Kayama1, YunTae Lee2, Yukihide Tsuji2, Shinwook Yi2, Moon-Hyun Cha2, Jaehoon Jeong2 (1. Samsung Japan Corp., 2. Samsung Electronics Corp.)
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