Presentation Information
[P-31]OPC+: GPU-Accelerated Lithography Simulation with Contour-Based Calibration and Unified Inverse Mask Optimization
*Po-Hsun Fang1, Pokai Chang1, Kuan-Hsun Wang1, Zhi-Sheng Wang1, Han-Xuan Huang1, Shie-Yuan Wang1, Peichen Yu1 (1. National Yang Ming Chiao Tung Univ.)
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