Presentation Information
[Session_11-01]Atomistic Modeling of Mg-Ion Implantation into GaN using an Efficient Machine-Learned Interatomic Potential
*Yuki Ohuchi1,3, Robert Stella2,3, Sabine Leroch2,3, Lado Filipovic2,3 (1. Advanced Technology Laboratory, Fuji Electric Corp. Ltd., 2. CDL for Multi-Scale Process Modeling of Semiconductor Devices and Sensors at the, 3. Inst. for Microelectronics, TU Wien)
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