[Session 6] Session 6: Process Simulation

9:30 AM - 9:50 AM JST(12:30 AM - 12:50 AM UTC)

[Session_6-01] Unified Lattice Kinetic Monte Carlo Model for Epitaxy, Etch and Reflow Processes for Advanced Semiconductor Device Architectures

*Alexander Schmidt¹, Kyungmi Yeom¹, Byounghak Lee², Marton Voeroes², Hiroyuki Kubotera², Woosung Choi², Anthony Payet³, Takeshi Nishimatsu³, Hiroo Koshimoto³, Joohyun Jeon¹, Seungmin Lee¹, Jaehoon Jeong¹ (1. Samsung Electronics Co., Ltd, 2. Samsung Semiconductor Inc., 3. Samsung Device Solutions R&D Japan)