Presentation Information

[Session_9-04]Impact of Thermal Expansion Mismatch-Induced NMOS Metal Gate Stress on MBCFET Performance

*Sung-Ho Kim1, Sooyoung Park1, Chang Ju Moon1, Jong Su Kim1, Jaehong Lee1, Yoon-Suk Kim1, Seung Hyun Song1, Yonghee Park1, Jaehoon Jeong1 (1. Samsung Electronics Corp., Ltd.)

Comment

To browse or post comments, you must log in.Log in