Presentation Information

[6-03]Study on the Application and Reliability of High-k HfO2/ZrO2 Superlattice Dielectrics in Ge Stacked Nanosheet GAAFET at 4K Ultra-Low Temperature

*KAO TZU-I1, Huang Kai-Wei1, Wei Chen-You2, Lin Yi-Wen1, Hou Fu-Ju3, Luo Guang-Li 3, Wu Yung-Chun1,2 (1. Dept. of Engineering and System Science, National Tsing Hua Univ. (Taiwan), 2. College of Semiconductor Research, National Tsing Hua Univ. (Taiwan), 3. Taiwan Semiconductor Research Inst. (Taiwan))

Comment

To browse or post comments, you must log in.Log in