[6] Poster Session

[6-08] BEOL-Compatible Annealing Effects on Properties of ALD NbO_X Films

*Gaoqi Yang¹, Ruiqing Xie¹, Linbo Shan¹, Jiye Li¹, Zongwei Wang^1,2, Yimao Cai^1,2 (1. School of Integrated Circuits, Univ. of Peking (China), 2. Beijing Advanced Innovation Center for Integrated Circuits (China))