Presentation Information
[6-29]All-in-one Monolithic 3D Heterostructured Integration of BEOL- Complementary N-Si FinFET / P-CNFET for Smart Edge Processing
*SHUANG Liu1,2, Feixiong Wang1,2, Heyi HUANG1,2, Yadong Zhang1,2, Yanqing Li1,2, Yanzhao Wei1,2, Huaxiang Yin1,2 (1. State Key Laboratory of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics of the Chinese Academy of Sciences (China), 2. School of Integrated Circuits, University of Chinese Academy of Sciences (China))
Comment
To browse or post comments, you must log in.Log in