Presentation Information
[C-6-05]RFマグネトロンスパッタリング法によるCo3O4薄膜の作製とp-Co3O4/n-Siヘテロ接合の特性
〇Kaede Ito1, Hiroyasu Ishikawa1 (1. Shibaura Institute of Technology)
Keywords:
Oxide Semiconductor,Solar Cell,RF Magnetron Sputtering Method,Thin film
Oxide Semiconductor,Solar Cell,RF Magnetron Sputtering Method,Thin film