[18p-A36-1~11] 先端イオン/電子顕微鏡技術のナノスケール材料・デバイスへの応用展開

17:45 〜 18:15英語発表

[18p-A36-11] Characterization of monolayer film with an advanced ULV-SEM

〇Takaya Nakamura¹, Masayasu Nagoshi¹, Kaoru Sato¹, Hiroki Ago² (1.JFE Techno-Research Corp., 2.Faculty of Engineering Sciences, Kyushu University)

キーワード：

2D materials、MoS2、SEM

Two-dimensional (2D) materials with atomic-level thicknesses are attracting attention because of their novel electronic, optical, and magnetic properties. It is important to control the number of layers, composition, and structure of these 2D materials, and thus a method to evaluate them quantitively and easily is required. In recent years, SEM and related techniques have made remarkable progress. In this study, we characterized 2D materials such as graphene oxide (GO) and molybdenum disulfide (MoS₂) using the latest ULV-SEM equipped with a windowless EDX. This ULV-SEM/windowless EDX will provide characterization of various 2D materials with a high throughput.