セッション詳細
[18p-A36-1~11]先端イオン/電子顕微鏡技術のナノスケール材料・デバイスへの応用展開
2024年9月18日(水) 13:30 〜 18:15
A36 (朱鷺メッセ3F)
小川 真一(産総研)、 大塚 祐二(東レリサーチセンター)
[18p-A36-1]Application of Advanced ion / electron microscopy for future nano scale materials and devices -Introduction to the Symposium-
〇Shinichi Ogawa1, Jun Taniguchi2 (1.AIST, 2.TUS)
[18p-A36-2]From Dual Damascene to Semi-Damascene and new materials: opportunities for characterization in interconnects
〇Zsolt Tokei1 (1.IMEC)
[18p-A36-3]Evaluation of hydrogen-gas-field-ionization ion source and its application
〇Shinichi Matsubara1, Hiroyasu Shichi1, Tomihiro Hashizume2 (1.Hitachi, Ltd. CDS, 2.Hitachi, Ltd. CER)
[18p-A36-4]Nanoscale High-Transition Temperature Josephson Junctions and SQUIDs
〇Shane Cybart1 (1.UC Riverside)
[18p-A36-5]Nanosized quantum sensor spots in hexagonal boron nitride created using helium ion microscopy
〇Kento Sasaki1 (1.UTokyo)
[18p-A36-6]Charge trap memory based on MoS2 with He+-irradiated h-BN as a trapping layer
〇Mahito Yamamoto1, Takuya Iwasaki2, Keiji Ueno3, Takashi Taniguchi2, Kenji Watanabe2, Yukinori Morita4, Shinichi Ogawa4, Yutaka Wakayama2, Shu Nakaharai5 (1.Kansai Univ., 2.NIMS, 3.Saitama Univ., 4.AIST, 5.Tokyo Univ. Tech.)
[18p-A36-7]Graphene phononic devices for thermal rectification with He Ion beam technology
〇Fayong Liu1, Kaidi Sun1, Qianyu Jia1, Haiyong Zheng1, Manoharan Muruganathan2, Hiroshi Mizuta2 (1.Ocean Univ. of China, 2.JAIST)
[18p-A36-8]Direct Patterning in Ultrathin Silicon Nanosheets Utilizing Helium Ion Beam Irradiation
〇Yukinori Morita1, Kensuke Inoue2, Ryuichi Sugie2, Shinichi Ogawa1 (1.AIST, 2.TRC)
[18p-A36-9]In-situ and precise atomic-scale transmission electron microscopy for electronic materials
〇Yukio Sato1 (1.Kumamoto Univ.)
[18p-A36-10]Mapping Dielectric Response of Materials by Time-Resolved Electron Holography
〇Yoh Iwasaki1, Toshiaki Tanigaki2, Keiko Shimada1, Ken Harada1, Daisuke Shindo1 (1.RIKEN, 2.Hitachi, Ltd.)
[18p-A36-11]Characterization of monolayer film with an advanced ULV-SEM
〇Takaya Nakamura1, Masayasu Nagoshi1, Kaoru Sato1, Hiroki Ago2 (1.JFE Techno-Research Corp., 2.Faculty of Engineering Sciences, Kyushu University)