[19p-P05-1~33] 21 合同セッションＫ「ワイドギャップ酸化物半導体材料・デバイス」（ポスター）

英語発表

[19p-P05-32] Study the deposition mechanism for ZnO thin films using a novel deposition method, “Electrostatic Spray Deposition” and property measurement

〇(D)Fysol Ibna^1,2, Mutsumi Sugiyama^1,3 (1.Department of Electrical Engineering, Tokyo University of Science, 2.University of Dhaka, Faculty of Science, Dhaka-1000, Bangladesh, 3.Research Institrute, RIST, Tokyo University of Scienece)

キーワード：

Electrostatic spray deposition (ESD)、Thin film、ZnO

This investigation revealed the ZnO (E_g =3.37 eV) growth mechanism for solution-dependent electrostatic spray deposition (ESD) [1]. For making the ESD spray solutions, zinc chloride (ZnCl₂) was used with ethanol (CH₃CH₂OH) for preparing the six different 0.1 M precursor solutions by changing the Hydrochloric acid (HCl) and water (H₂O) ratio. Numerous microstructure parameters were also studied. by ESD during ZnO thin film formation.