講演情報
[9p-E101-5]0.33 NA EUV Systems for High Volume Manufacturing
〇Daisuke Horimoto
キーワード：
EUV、Lithography、ASML
In recent years, EUV lithography equipment has become a fundamental and crucial piece of system and technology in the manufacturing of advanced semiconductor chips. This presentation will describe the current status and future roadmap of NA0.33 EUV lithography system used in high volume production fabs around the world.