Presentation Information
[3G_PL02]Current Status and Future Prospect of Resist Materials for EUV Radiations
*Takahiro Kozawa1 (1. UOsaka)
As Japan enters the era of EUV lithography to establish domestic production of cutting-edge semiconductors, this session explores the technologies driving this shift.
Experts leading national projects will introduce novel accelerator-based EUV light sources—a departure from conventional laser methods—alongside the latest research on photoresist materials. Hosted in Kumamoto, a key hub for semiconductor manufacturing, this session provides vital insights for the industry's future, covering the next generation of technology and materials.
Experts leading national projects will introduce novel accelerator-based EUV light sources—a departure from conventional laser methods—alongside the latest research on photoresist materials. Hosted in Kumamoto, a key hub for semiconductor manufacturing, this session provides vital insights for the industry's future, covering the next generation of technology and materials.