Session Details
[3G_PL]The Cutting Edge of Accelerator EUV Light Sources and Resist Materials for Advanced Semiconductor Manufacturing
Fri. Mar 13, 2026 1:00 PM - 2:30 PM JST
Fri. Mar 13, 2026 4:00 AM - 5:30 AM UTC
Fri. Mar 13, 2026 4:00 AM - 5:30 AM UTC
Room G(Kumamoto-jo Hall 4F Conference RoomC)
Chair:Hiroyuki Toyokawa(AIST)
[3G_PL01]Free-Electron Laser EUV light Source
*Yosuke Honda1 (1. KEK)
[3G_PL02]Current Status and Future Prospect of Resist Materials for EUV Radiations
*Takahiro Kozawa1 (1. UOsaka)
