Presentation Information

11:00 AM - 11:20 AM JST(2:00 AM - 2:20 AM UTC)

[3G07]Permeability of Developer Solution in Photoresist for EUV Applications

*Naoto Yanase¹, Eri Hattori¹, Tadashi Kajiya¹, Yasuhiro Kawatani¹, Mitsuhiro Fujita¹, Kazuhiro Marumo², Hokuto Yamazaki² (1. Analysis Technology Center, FUJIFILM Corporation (Japan), 2. Electronic Materials Research & Development Center, FUJIFILM Corporation (Japan))

Keywords:

polymer thin film,solvent swelling,spectroscopic reflectometry

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