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OralPlasma Science & Technologies

Plasma Science & Technologies 9

Thu. Mar 6, 2025 6:00 PM - 6:45 PM JST
Thu. Mar 6, 2025 9:00 AM - 9:45 AM UTC
Room A(Active Plaza)
Chair:Bibhuti Bhusan Sahu(Indian Institute of Technology (IIT) Delhi), Kenji Ishikawa(Nagoya University)
Plasma treatments
6:00 PM - 6:30 PM JST(9:00 AM - 9:30 AM UTC)

[06pA11I]Science and Engineering of Novel Magnetron Sputtering and PECVD Sources for Thin Film Depositions

*Bibhuti Bhusan Sahu1, Nisha1, Salini Datta1 (1. Indian Institute of Technology (IIT) (India))
6:30 PM - 6:45 PM JST(9:30 AM - 9:45 AM UTC)

[06pA14O]Fluorinated Alcohol-Based Plasma Etching to Reduce PFC Emissions

*Sanghyun You1, Jihyun Kim2, Chang-Koo Kim1 (1. Ajou University (Korea), 2. Seoul National University (Korea))
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