International Symposium on Sputtering & Plasma Processes (ISSP2026)
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Session Details

Oral Presentation3.Pulsed Sputtering and HiPIMS

Oral Session HP1

Thu. Jul 2, 2026 8:40 AM - 10:20 AM JST
Thu. Jul 2, 2026 11:40 PM - 1:20 AM UTC
Oral(Science Hall)
Chair:Takeo Nakano(Seikei University)
8:40 AM - 9:20 AM JST(11:40 PM - 12:20 AM UTC)

[HP1-01]High Power Impulse Magnetron Sputtering: From Fundamental Concepts to Industrial Applications

*Ralf Bandorf1, Holger Gerdes1, Stefan Körner1, Dennis Barton1, Ju-Liang He2, Ying-Hong Chen2, Pin-Yeng Hsieh2, Thomas Schütte3 (1. Fraunhofer Institute for Surface Engineering and Thin Films IST, 2. Fraunhofer Innovation Platform for Surface and Production Engineering for Optical and Electrical Systems at Feng Chia University FIP-SPE@FCU, 3. PLASUS GmbH)
9:20 AM - 9:40 AM JST(12:20 AM - 12:40 AM UTC)

[HP1-02]Influence of discharge parameters on the properties of TiO2 films
grown by reactive bipolar HiPIMS discharges

*Stanislava Debnarova1,2, Matthieu Michiels3, Stephanos Konstantinidis2 (1. Faculty of Science, Masaryk University, 2. Plasma-Surface Interaction Chemistry, University of Mons, 3. Haute École en Heinaut)
9:40 AM - 10:00 AM JST(12:40 AM - 1:00 AM UTC)

[HP1-03][Withdrawn]

10:00 AM - 10:20 AM JST(1:00 AM - 1:20 AM UTC)

[HP1-04]Industrial HiPIMS – Process challenges, trends and innovations

*Erik Johan Bohlmark1 (1. Ionautics AB)
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