International Symposium on Sputtering & Plasma Processes (ISSP2026)
Advanced Search

Session Details

Oral Presentation3.Pulsed Sputtering and HiPIMS

Oral Session HP1

Thu. Jul 2, 2026 8:40 AM - 10:20 AM JST
Thu. Jul 2, 2026 11:40 PM - 1:20 AM UTC
Oral(Science Hall)
8:40 AM - 9:20 AM JST(11:40 PM - 12:20 AM UTC)

[HP1-01]High Power Impulse Magnetron Sputtering: From Fundamental Concepts to Industrial Applications

*Ralf Bandorf1, Holger Gerdes1, Stefan Körner1, Dennis Barton1, Ju-Liang He2, Ying-Hong Chen2, Pin-Yeng Hsieh2, Thomas Schütte3 (1. Fraunhofer Institute for Surface Engineering and Thin Films IST, 2. Fraunhofer Innovation Platform for Surface and Production Engineering for Optical and Electrical Systems at Feng Chia University FIP-SPE@FCU, 3. PLASUS GmbH)
9:20 AM - 9:40 AM JST(12:20 AM - 12:40 AM UTC)

[HP1-02]Influence of discharge parameters on the properties of TiO2 films
grown by reactive bipolar HiPIMS discharges

*Stanislava Debnarova1,2, Matthieu Michiels3, Stephanos Konstantinidis2 (1. Faculty of Science, Masaryk University, 2. Plasma-Surface Interaction Chemistry, University of Mons, 3. Haute École en Heinaut)
9:40 AM - 10:00 AM JST(12:40 AM - 1:00 AM UTC)

[HP1-03]Temperature-Driven Phase Evolution in Sputtered Ba–Cu–S Thin Films

*Younes LABLALI1, Olivier Donzel-Gargand2, Jonathan J. Staaf Scragg2, Mohammed Makha1 (1. College of Chemical Sciences and Engineering (CCSE), Department of Materials Science, Energy and Nano-engineering (MSN), Mohammed VI Polytechnic University (UM6P), 43150 Benguerir, Morocco, 2. Division of Solar Cell Technology, Department of Materials Science and Engineering, Uppsala University, Uppsala 75237, Sweden)
10:00 AM - 10:20 AM JST(1:00 AM - 1:20 AM UTC)

[HP1-04]Industrial HiPIMS – Process challenges, trends and innovations

*Erik Johan Bohlmark1 (1. Ionautics AB)
Back to Category List