Session Details

[P]9.電気・磁気関連材料

Tue. Mar 17, 2020 3:00 PM - 5:00 PM JST
Tue. Mar 17, 2020 6:00 AM - 8:00 AM UTC
Poster Session Centennial Hall

[P110]Magnetic properties and Mossbauer effect of Fe2-xMnGa1+x (x = 0 ~ 0.5) alloys.

*MIURA Yuta1, SHIMA Toshiyuki2, DOI Masaaki2 (1. Tohoku gakuin Univ, 2. Tohoku gakuin Univ)

[P111]Effect of 3D-seed on coercivity of post-annealed Nd-Fe-B thin films

*FURUSAWA Kohei1, KOIKE Kunihiro1, KATO Hiroaki1, INABA Nobuyuki1, ITAKURA Masaru2, SAITO Yu3, OKUBO Susumu3, OTA Hitoshi3 (1. Yamagata Univ., 2. Kyushu Univ., 3. Kobe Univ.)

[P112]Magnetic properties of rapid-crystallized Nd-Fe-B thin films by infrared laser annealing

*UCHIDA Tokunosuke1, KOIKE Kunihiro1, KATO Hiroaki1, INABA Nobuyuki1, ITAKURA Masaru2, SAITO Yu3, OKUBO Susumu3, OTA Hitoshi3 (1. Yamagata Univ., 2. Kyushu Univ., 3. Kobe Univ.)

[P113]Production of SmFe3–based magnets by hot deformation

*Ogawa Yusuke1, Saito Tetsuji1 (1. Chiba Institute of Technology)

[P114]Crystallization process and magnetic domains of amorphous soft magnetic alloy

*OSAKO Akihiro1, YODOSHI Noriharu4, FUJIBAYASHI Yukihiro2, UCHIHASHI Kento2, ISHII Yui3, HARADA Ken5, MORI Shigeo3 (1. Osaka Prefecture University (Bachelor), 2. Osaka Prefecture University (Master), 3. Osaka Prefecture University, 4. IMR, 5. RIKEN CEMS)

[P115]Preparation of anisotropic Nd-Fe-B thick film magnets by two step annealing with PLD

*Yamashita Akihiro1, Imai Junya2, Matsuo Munehiro3, Takashima Keisuke1, Yanai Takeshi1, Nakano Masaki1, Fukunaga Hirotoshi1 (1. Nagasaki Univ., 2. Nagasaki Univ., 3. Nagasaki Univ.)

[P116]Change in magnetic flux density due to inverse magnetostrictive effect of Fe-Co based alloy

*INOUE Shimpei1, Fujieda shun1, Osanai Fumiya2, Hashi Syuuitiro2, Ishiyama Kazush2, Seino Satoshi1, Nakagawa Takashi1, Yamamoto Yukio1 (1. Osaka University, 2. Tohoku University)

[P117]Crystallization mechanism of Ge thin films by MIC method using Au

*KOIZUMI Akira1, KYUNO Kentaro1 (1. Shibaura Institute of Technology)

[P118]Optical electrical characteristic improvement of ZnO-V and the ZnO-V-Al film

*KOIDE Takumi1, Yamashita Yuuri2, Yamane Haruki4, Kobayashi Masanobu3 (1. 千葉工大(院生)、2. 千葉工大(学生)、3. 千葉工大、4. 秋田産業技術センター)