Session Details

[G]Electric/Electronic/Optical Materials

Wed. Sep 15, 2021 1:00 PM - 4:00 PM JST
Wed. Sep 15, 2021 4:00 AM - 7:00 AM UTC
Rm. L ZoomRm.L
Chair:Hidekazu Tanaka(Osaka University)
※表示の講演時間には質疑応答時間も含みます。
(質疑応答時間5分、基調講演と招待講演は5~10分)

[262]Crystallization behavior of sputter grown amorphous MoTe2 films

*Yuta SAITO1, Shogo HATAYAMA1, Kotaro MAKINO1, Noriyuki UCHIDA1, Yi SHUANG2, Shunsuke MORI2, Yuji SUTOU2, Alexander KOLOBOV1,3, Paul FONS1,4 (1. AIST, 2. Tohoku Univ., 3. Herzen Univ., 4. Keio Univ.)

[263]Change in electrical properties of amorphous Cr2Ge2Te6 with various Cr contents

*Shogo HATAYAMA1,2, Keisuke KOBAYASHI3,4, Yuta SAITO1, Paul FONS1,5, Yi SHUANG2, Shunsuke MORI2, Alexander KOLOBOV1,6, Yuji SUTOU2 (1. AIST, 2. Tohoku Univ., 3. JASRI, 4. Kochi Univ. Tech., 5. Keio Univ., 6. Herzen State Pedagogical Univ.)

[264]Electronic transport mechanism of MnTe polymorph film

*Mihyeon Kim1, Shunsuke Mori1, Yi Shuang1, Shogo Hatayama1, Daisuke Ando1, Yuji Sutou1 (1. Tohoku Univ.)

[265]Absorption spectra of deteriorated PE

*Fumiki IWASAKI1, Sampei Hirose1, Noriyuki Sato2, Yukio Kawano3, Tabao Tanabe1 (1. Shibaura Institute of technology, 2. Industrial Technology Institute, 3. Chuo University)

break

[266]Preparation of sulfur doped Vanadium oxide thin films by multi-step chemical vapor deposition process and their electrical transport property

*Akira HIRAO1, Mahito YAMAMOTO2, Yutaka WAKAYAMA3, Hidekazu TANAKA4 (1. Sanken, Osaka Univ., 2. Kansai Univ., 3. NIMS, 4. Sanken, Osaka Univ.)

[267]Realization of the Fe3O4 thin film growth on transferable hBN flakes

*Shingo GENCHI1, Ai I. OSAKA1, Azusa N. HATTORI1, Kenji WATANABE2, Takashi TANIGUCHI2, Hidekazu TANAKA1 (1. Osaka Univ., 2. NIMS)

[268]Preparation of Ti-doped α-Fe2O3 thin films by sputtering

*Seishi ABE1 (1. Research Institute for Electromagnetic Materials)

[269]EELS measurement of surface plasmon polariton dark mode in MIM structure

*Kentaro Itaya1, Norihito Sakaguchi2, Yuji Kunisada2, Yasutaka Matsuo3 (1. Faculty of Engineering Hokkaido University, Japan,(Master’s degree), 2. Faculty of Engineering Hokkaido University, Japan, 3. RIES, Hokkaido University, Japan)

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[270]Characteristics of the Critical Current, n-value and Their Correlation of Superconducting Tapes with Multiple Small Cracks and One Accidental Crack

*Shojiro OCHIAI1, Hiroshi OKUDA2 (1. ESISM, Kyoto University, 2. Graduate School of Engineering, Kyoto University)

[271]Preparation of graphene based AD films and their near-field noise suppression effect

*Masato Watanabe1, Mitsuharu Sato2, Masashi Matsuura2, Satoshi Sugimoto2 (1. Res. Inst. for Electromagnetic Mater., 2. Grad. school of Eng. Tohoku Univ.)