Session Details

[P]P199~P215

Tue. Sep 19, 2023 3:00 PM - 4:30 PM JST
Tue. Sep 19, 2023 6:00 AM - 7:30 AM UTC
Hall, 1st Flr. at "TOYAMA Jiyukan " Hall, 1st Flr. at "TOYAMA Jiyukan "
※表示の講演時間には質疑応答時間も含みます。
(質疑応答時間5分、基調講演と招待講演は5~10分)

[P199]Corrosion behavior of Al-Zn alloys fabricated by spark plasma sintering

*EUIHYUK CHUNG1, NISHIMOTO MASASHI2, MUTO IZUMI2, SUGAWARA YU2 (1. Graduate School of Engineering, Tohoku University,2. School of Engineering, Tohoku University)

[P200]Diffusion Behavior of D2O in Oxide Films on Fe Formed in an NaOH Solution Containing Various Concentrations of Oxidants

*Taiki SAKAI1, Takumi HARUNA2 (1. Kansai Univ. Graduate student., 2. Kansai Univ.)

[P201]Effects of Pretreatment Etching Time for Electroless Ni Plating

LEONARDO THE THIRD HASATANI1, *JUNQING BAO1, KAZUHIKO NODA2 (1. Shibaura Institute of Technology (Graduate School), 2. Shibaura Institute of Technology)

[P202]Corrosion behavior of cold-worked Type 304 stainless steel

*Mitsutoshi MATSUMORI1, Yuta YAGI2, Kazuhiko NODA3, Yoshimi WATANABE4 (1. Shibaura Institute of Technology Graduate School, 2. Nakabohtec Corrosion Protecting CO., LTD., 3. Shibaura Institute of Technology, 4. Nagoya Institute of Technology)

[P203]Effect of Substrate Temperature on Microstructure of TiO2 Films Deposited by Glancing-angle Sputtering

*CHEN YUSOU1, INOUE YASUSHI2, TAKAI OSAMU3 (1. Chiba Inst. Technol., 2. Chiba Inst. Technol., 3. Kanto Gakuin Univ.)

[P204]Properties of boronized layer on sintered alloy made by ball-milling CoCrFeMnNi high-entropy alloy powder

*Jiaxin PENG1, Akio NISHIMOTO2 (1. Kansai University, 2. Kansai University)

[P205]Effect of screen wire diameter on plasma nitriding using Ti-Mo combination screen

*Fumiya OKADA1, Yasuhiro HOSHIYAMA2, Tomoki MARUOKA3 (1. 関西大学(院生)、2. 関西大学、3. 京都産業技術研究所)

[P206]Rate-limiting Factors in Adsorption-induced Electrochromic Phenomena of InN Films

*Masaki Watanabe1, Haruka Murotu2, Yasushi Inoue3, Osamu Takai4 (1. 千葉工大工(学生)、2. TDK株式会社、3. 千葉工大工(教授)、4. 関東学院大材料)

[P207]Hardness and color of TiN thin films on addition of Yb

*BIN ONN KHAIRUL ABRAR1, SHU SAWAYA1, TSUNEO SUZUKI1 (1. Nagaoka Univ. of Tech.)

[P208]Production and microstructure analysis of periodic oxygen-deficient HfO2-x

*Kai IMAMURA1, Mitsuhiro MATSUDA2, Masahiro SHOZAKI3, Kenji SHIDA3, Motohide MATSUDA2 (1. Grad. Sch. Sci. Tech. Kumamoto Univ., 2. Fac. Adv. Sci. Tech. Kumamoto Univ., 3. Tech. Div. Kumamoto Univ.)

[P209]Wear characteristics of Cantor alloy thin films using sputtering method

*Daisuke TANADA1, Yozi MIYAZIMA2, Kazuhiro ISHIKAWA2 (1. Kanazawa Univ., 2. Inst. of Kanazawa Univ.)

[P210]Substrate Temperature Dependence of Ru Thin Film Crystallographic Orientation by Sputtering Method

*Sakabe Hitoki1, Sato Reo1, Nagano Takatoshi1, Shibachi Yutaro2 (1. Ibaraki University Science and Engineering, 2. FURUYA METAL Co.)

[P211]Fabrication of highly smooth magnesium by anodic dissolution in glycol solutions

*Shunsuke TOMITA1, Tatsuya KIKUCHI2 (1. Hokkaido univ.(M1), 2. Hokkaido univ.)

[P212]Effect of Bi concentration of electrodeposited Ag-Bi alloy layer

*Changgyun Kim1, Seoyoung An1, Injoon Son1 (1. Kyungpook National University)

[P213]First-principles study of trace (Pt, Pd, Ni)-dope Al13Fe4 (010) surface

*Shota IWADO1, Satoshi Kameoka2, Yasushi Ishii3, Kazuki Nozawa4 (1. Kagoshima Univ., 2. IMRAM Tohoku Univ., 3. Chuo Univ., 4. Kagoshima Univ.)

[P214]In-situ HAADF-STEM observation of catalyst metal aggregation process

*Kousuke Nakano1, Norihito Sakaguchi2, Yuuji Kunisada2 (1. Grad. School Eng., Hokkaido Univ., 2. Faculty Eng., Hokkaido Univ.)

[P215]Two-dimensional surface mapping of hydrogen oxidation reaction activity for Ir polycrystalline electrode surface

*Masaki Sapei1, Daisuke Noda1, Kenta Hayashi2, Naoto Todoroki1, Toshimasa Wadayama1 (1. Tohoku Univ.)