Presentation Information
[315]Evaluation of Fracture Mechanics Fatigue Crack Propagation Rate at the Interface Si Die and Underfill in Real Semiconductor Package Structures
*Akito AIZAWA1, Yoshiharu KARIYA2, Yuichi YANAKA3, Mitsuki NAKATA3 (1. Graduate School of Shibaura Institute of Technology, 2. College of Engineering, Shibaura Institute of Technology, 3. RESONAC Corporation)
Keywords:
the Interface Si Die and Underfill,Fatigue Crack Propagation Rate,Real Semiconductor Package Structures,response surface analysis,Box-Behnken Project
半導体パッケージのSiダイ / UF界面の疲労き裂進展速度を計測するため,統計的手法を用いて実験を容易にする最適形状を決定した結果,従来試験片に比べ,確実にき裂の発生・進展が可能であることが確認された.
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