Session Details

[IS]IS2 Recent Trends and Future Perspectives of Semiconductor Materials

Fri. Sep 19, 2025 9:00 AM - 11:20 AM JST
Fri. Sep 19, 2025 12:00 AM - 2:20 AM UTC
Room A(Open Hall)
Chair:Yuta Saito, Kenichi Ikeda
※表示の講演時間には質疑応答時間も含みます。
(質疑応答時間5分、基調講演と招待講演は5~10分)

[Opening address]Opening Remark

Seiji Miura1 (1.Hokkaido University)
Comment()

[IS2.1]Oxide Semiconductor Transistor Technologies for LSIApplications

*Masaharu Kobayashi1 (1. The University of Tokyo)
Comment()

[IS2.2]Grain-engineered Co Alloys for Scaled Interconnects

*KIYOUNG LEE1 (1. Department of Materials Science & Engineering, HONGIK UNIVERSITY, Seoul, Korea)
Comment()

break

[IS2.3]Low dimensional nitride-based material system for neuromorphic computing

*Yi-Chia Chou1, Chang-Hsun Huang1, Chia-Yi Wu1, Wei-Chih Chen1 (1. National Taiwan University, Taipei, Taiwan)
Comment()

[IS2.4]Nanostructured centrosymmetric semiconductors forferroelectric-like bulk photovoltaics

*Yun Liu1 (1. Australian National University)
Comment()