Year 2025 Spring Annual Meeting of JIMM
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Session Details

ポスターセッション9.Electric/Electronic/Optical Materials : Electric/Electronic/Optical Materials

[P]P3~P10

Sat. Mar 8, 2025 1:00 PM - 2:30 PM JST
Sat. Mar 8, 2025 4:00 AM - 5:30 AM UTC
1st floor Building No.8/1st floor Building No.9(P3~P10,P85~P95)

[P3]Structure and Magnetic Properties of Co-Fe-Ni Ternary Alloy Thin Films on MgO Single Crystals

Takahiro Matsunaga1, Momotaro Umetsu1, Masashi Matsuura1, *Nobuki TEZUKA1 (1. Tohoku Univ.)
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[P4]Heteroepitaxial growth of L10-MnGa ultrathin films on highly mismatched substrates.

*Kazuya Suzuki1, Naoki Kamata2, Shigemi Mizukami3,4 (1. JAEA　ASRC, 2. Tohoku Univ., 3. TohoKu. Univ. AIMR, 4. Tohoku. Univ. CSIS)
Comment()

[P5]Demagnetization process of exchange-coupled Sm(FeCo)12/FeCo system nanocomposite

*Shota Kobayashi1, Nobuyuki Inaba2, Hiroaki Kato2, Masaru Itakura3, Masaki NaKano4, Shin Ookubo5, Hitoshi Ohta5, Kunihiro Koike2 (1. Yamagata Univ. (Master), 2. Yamagata Univ., 3. Kyushu Univ., 4. Nagasaki Univ., 5. Kobe Univ.)
Comment()

[P6]Magnetic property of exchange-cupled Nd2Fe14B/FeCo/Nd2Fe14B multilayer film

*Yuto Shimizu1, Nobuyuki Inaba1, Hiroaki Kato1, Masaru Itakura2, Masaki Nakano3, Susumu Okubo4, Hitoshi Ohta4, Kunihiro Koike1 (1. Yamagata Univ., 2. Kyushu Univ., 3. Nagasaki 1Univ., 4. Kobe Univ.)
Comment()

[P7]Microstructural analysis of Nd-Fe-B micromagnets fabricated by PLD-LIFT method

*Takeru YASUNAGA1, Masaru ITAKURA1, Hiroshi AKAMINE1, Kunihiro KOIKE2, Masaki NAKANO3 (1. 九大総理工、2. 山形大理工、3. 長大工)
Comment()

[P8]Improvement of thermal stability in Sm(Fe-Co)12-B thin films by addition of Nb element

*Yuichi Mori1, Soga Nakatsuka1, Masaaki Doi2, Toshiyuki Shima2 (1. Graduate school of Engineering, Tohoku Gakuin University, 2. Tohoku Gakuin University)
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[P9]Synthesis and Characterization of Iron Nitride Nanocrystalline Soft Magnetic Materials

*Rinto SAMATA1, Takahiro Yamazaki2, Masato Kotsugi3 (1. Tokyo University of Science(B), 2. Tokyo University of Science(AP), 3. Tokyo University of Science(P))
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[P10]Fabrication of Ge crystal thin films by co-sputtering of AuGe

*Masaru SUSA1, Kentaro Kyuno2,3 (1. Shibaura Institute of Technology(graduate student), 2. Shibaura Institute of Technology, 3. Center for Semiconductor Human Resource Development, Shibaura Institute of Technology)
Comment()
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