Presentation Information
[19p-P05-5]Development of solar cells using titanium dioxide thin film formed by sputtering
〇Wataru Yamazaki1, Masao Isomura1, Tetsuya Kaneko1 (1.Tokai Univ.)
Keywords:
solar cell
This study aims to apply TiO2 deposited by RF magnetron sputtering as an electron selective layer in crystalline silicon solar cells. In this study, a p-type layer with high impurity concentration is formed by thermal diffusion through an annealing process, and an ohmic junction is formed by tunneling effect. In this study, we investigated the optimal annealing temperature for the formation of ohmic contact.