[20a-A302-1~10] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[20a-A302-4] Hydrogen treatment of NiO epitaxial layers

〇Takashi Yasuda¹, Mizuru Kimura¹, Shogo Satomi¹, Shinji Nakagomi¹ (1.ISU)

Keywords:

nickel oxide,hydrogen,electrical properties

Crystalinity and electrical properties of NiO epitaxial layers by hydrogen heat treatment.