[20a-C401-1~12] 1.3 Novel technologies and interdisciplinary engineering

11:30 AM - 11:45 AM JST(2:30 AM - 2:45 AM UTC)

[20a-C401-9] Process Control for Nano-structures from Al₂O₃ Thin Film Deposited by ALD with Hydrothermal Teatment

〇Taegyu Woo¹, Yuuki Tsuji¹, Syouhei Lin¹, Yudai Isahaya¹, Chishu Mori¹, Taro Itatani², Joji Maeda¹, Takeru Amano² (1.Tokyo Univ. of Science, 2.AIST)

Keywords:

Atomic Layer Deposition,Nano-Sturucture,Hydrothermal treatment

Al2O3 thin films deposited by atomic layer deposition method form nanostructures by hydrothermal treatment. It has been demonstrated that this nanostructure suppresses surface reflection and improves heat dissipation properties due to its composite structure with metal. In this presentation, we report our attempt to control the nanostructure formation by changing the conditions of ALD deposition and hydrothermal treatment.