Presentation Information

[20p-A201-6]UV Nanoimprinting process development for large-scale integrated photonics

〇Tomohiro Amemiya1, Sho Okada1, Naoki Takahashi1, Ryuya Sasaki1, Tsuyoshi Horikawa1, Yuki Atsumi2, Yuki Oda3, Yuta Hara3, Shinji Noda3, Hiroshi Yamamoto3, Thomas Uhrmann3, Andrea Kneidinger3, Risako Mori4, Yasushi Fujii4, Takahiro Asai4, Dai Shiota4, Nobuhiko Nishiyama1 (1.Tokyo Tech, 2.AIST, 3.EVG, 4.TOK)

Keywords:

photonic integrated circuits,silicon photonics,UV nanoimprint lithography