[20p-A310-1~12] CS.1 Code-sharing Session of 2.3 & 7.4

3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

[20p-A310-8] Dry Atomic layer Etching of metal films by neutral cluster beam

〇Hideyuki Tanaka¹, Masaya Takeuchi¹, Noriaki Toyoda¹ (1.Univ Hyogo)

Keywords:

Atomic Layer Etching,neutral gas cluster beam