Presentation Information
[21a-A308-9]Study of fabrication error tolerance of high-Q photonic crystal nanocavities
〇Eiichi Kuramochi1,2, Akihiko Shinya1,2, Masaya Notomi1,2 (1.NTT-BRL, 2.NTT-NPC)
Keywords:
photonic crystal,optical cavity,photonics chip
In this study, we experimentally evaluated the impact of fabrication error on the performance degradation of photonic crystal nanocavity by inducing the fabrication error by the control of electron beam resist patterning processes at it was independent on electron beam writer. We revealed that in L3 nanocavities, there were designs in which the experimental Q-factor reduction due to the enhanced fabrication error was serious or slight. In the talk, we will discuss about the design guidelines for fabrication error tolerant photonic crystal nanocavities based on theory and experiment.