[21a-P03-1~16] 6.4 Thin films and New materials

[21a-P03-11] Improvement of properties of p-type transparent semiconductor CuI thin film fabricated by electron beam evaporation

〇Takashi Inomata¹, Manabu Kimoto², Keisuke Fujita³, Tomokazu Nagao³ (1.Kisan Kinzoku Chemicals, 2.TECHNO ASSOCIE, 3.NBC Meshtec)

Keywords:

p-type transparent semiconductor,CuI thin film,Vacuum deposition

Nowadays, the movement toward a decarbonized society has become active, and there is growing interest in devices that convert heat and light into energy. It is desirable that they have a film shape that allows flexibility in the installation environment. In this work, we focused on CuI, which enables the fabrication of good p-type transparent semiconductor thin films without heating the substrate, and developed evaporation materials that can improve the properties of CuI thin film. The CuI thin film fabricated with the developed evaporation material showed higher values for both transmittance and conductivity than ordinary CuI vapor deposition films.