Presentation Information
[21p-P01-11]Infrared Spectroscopic Study on Amorphous Carbon Deposition Process during Methylacetylene Plasma
〇Atsuya Kuwada1, Yuto Oishi1, Masanori Shinohara1, Satoshi Tanaka2, Takashi Matsumoto2 (1.Fukuoka Univ., 2.Tokyo Electron Technology Solutions)
Keywords:
Methylacetylene,Deposition process,Infrared spectroscopy
Deposition process during methylacetylene (CH3-C2H) plasma was investigated with multiple-internal-reflection infrared spectroscopy. From the infrared spectroscopic results, the sp2-C and the sp3-CH2 is formed in the deposited film. Compared with acetylene plasma process, sp2-C peak has the same intensity but the sp3-CH2 peak are much large. It indicates that CH3 of methylacetylene behave as a hydrogen source supplied to surface components during deposition.