Presentation Information

[22a-D903-9]Investigation of improvement of hole penetration depth in pentacene by plasma nitriding of SiO2

〇Naoki Goto1, Yutaro Irie1, Hajime Saito1, Yoshitaka Iwazaki1, Tomo Ueno1 (1.Tokyo univ. of Agri & Tech)

Keywords:

organic semiconductor