[22p-B205-1~19] 12.1 Fabrications and Structure Controls

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[22p-B205-7] Interfacial Molecular Compatibility for Programming Organic-Metal Oxide Superlattices

〇(M2)Takeshi Ono¹, Sae Mitamura¹, Takuro Hosomi¹, Hikaru Saito², Midori Ikeuchi², Jiangyang Liu¹, Kazuki Nagashima³, Tsunaki Takahashi¹, Wataru Tanaka¹, Masaki Kanai², Takeshi Yanagida^1,2 (1.Eng., The Univ. of Tokyo, 2.IMCE, Kyushu Univ., 3.Hokkaido Univ.)

Keywords:

self-assembled monolayer,atomic layer deposition

Organic-metal oxide superlattices consisting of thin organic films (Self-Assembled Monolayers, SAMs) and metal oxides were successfully fabricated. Aliphatic phosphonic acid molecules with varied terminal functional groups were synthesized and utilized as organic materials to form SAMs. Atomic Layer Deposition (ALD) was utilized for fabricating metal oxide layers. SAMs consisting of aliphatic phosphonic acids and ALD processes were systematically modulated and characterized from various aspects by IR, QCM, and STEM observations to clarify significant requirements for the successful fabrication of organic-metal oxide superlattices.