[23p-A303-1~8] 13.3 Insulator technology

2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[23p-A303-4] Evaluation of GeO₂ film by annealing treatment

〇Yuta Tsuchiya¹, Hazime Saito¹, Yoshitaka Iwasaki¹, Tomo Ueno¹ (1.Tokyo Univ. of Agri and Tech)

Keywords:

annealing,semiconductor